2020 Chin Mei

chin mei

Redress Design Award 2020 Semi-FINALIST

Bio

Chin Mei is a semi-finalist of the Redress Design Award 2020. She graduated from Sichuan Normal University with a Bachelor’s Degree in Art Design of Opera, Film and TV Programme (Fashion Design). She continued her studies at Bunka Fashion College in Tokyo in Fashion Technology Department  and founded her own fashion label, Meichin Studio, in 2018.

“This year's Covid-19 pandemic has impacted our fashion industry in so many ways,  highlighting the urgency for the adoption of more sustainable practices throughout the industry. As a fashion designer, I want to be a part of this new movement. I believe that sustainability is not just about environmentalism, but also about the balance of the industry structure and economic benefits”. - Chin Mei

redress Design Award Collection

For her Redress Design Award Collection, Knitting a Jumper, Mei was inspired by the cherished one-of-a-kind sweaters her mother knitted for her in childhood- each stitch filled with love.  She will create her yarn by up-cycling end-of-rolls, cut-and-sew waste and reconstruct unsold clothing waste and will apply traditional knitting techniques creating a modern collection with unique textures.

News

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